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TEAM E-LEARNING COURSES

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  • HOME
  • INTRODUCTION
  • COMPULSORY COURSES FOR ACCESS
    • Introduction to cleanroom activities
    • Chemical risks prevention
    • Use of O2 plasma
    • Photolithography introduction
    • Characterization introduction
    • MyFab Introduction to basic uses
    • Use of clean room airlock
    • Quizz scores review (admins only)
  • TECHNICAL COURSES
    • - CARACTERISATION / CHARACTERIZATION
    • - CVD AND ALD
    • - ELECTRON BEAM LITHOGRAPHY
    • - INK JET and surface treatment
    • LASER LITHOGRAPHY ( Masks conception, Equipment and processes)
    • - PACKAGING AND INTEGRATION
    • - PHOTOLITHOGRAPHY
  • MYFAB advanced use
    • - Myfab - How having a personnal process notebook

Version française - Pascal Dubreuil - 2022

  • Les matériaux déposés par CVD et ALD                        (mp4-8'20'')  
  • Le principe du CVD et de l'ALD                                       (mp4-3'37'')
  • Les mécanismes chimiques en CVD thermique            (mp4-5'51'')
  • Les techniques CVD et ALD disponibles au LAAS       (mp4-8'07'')
  • La technique PECVD au LAAS                                         (mp4-8'41'')
  • La technique ICPECVD au LAAS                                     (mp4- 3'31'')
  • La technique ALD au LAAS                                               (mp4-12'14'')
  • Les contraintes dans les matériaux CVD                        (mp4 -6.21'')  

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